Industrial gas supply & equipment for the electronics industry
Recharging your business with packaged gases for the electronics industry
Linde is turning up the quality of our electronics materials to help you make a better product. Linde Gas & Equipment Inc. distributes packaged gases and serves the semiconductor, flat panel display, LED and solar markets; We deliver the materials you need to keep the world connected. From the purest industrial gases to the highest quality sputtering targets, we’ll work with you to understand your opportunities for differentiation — and help make it happen. We measure our success by how well we help you achieve yours.
Industrial gases for the electronics industry
Nitrogen
Often used in cooling and purging applications, nitrogen is essential in the production of electronics and semiconductors.
Argon
With its high stability and extremely low reactivity, argon is a critical gas used in solar and semiconductor wafer production.
Hydrogen
Used by a wide variety of electronics manufacturers, hydrogen acts as a carrier gas for thin-film deposition, and as a reducing agent in furnace treatments.
Helium
Critical to the flat panel display market, helium is used as a coolant, and is also a key component in creating the controlled environments necessary to build semiconducting devices.
Silane
Silane is a key raw material for the thin film deposition of amorphous and polysilicon films in the semiconductor, display and solar industries.
Ammonia
Ammonia is the most common nitrogen precursor in the growth of nitride-based thin films and epitaxial crystals. Ultra high purity is critical for epitaxial crystal applications in the LED industry.
Carbon Dioxide
High purity carbon dioxide assists with the removal of ultra-small particles in cleaning applications, and helps prevent the collapse of photoresist during drying for critical semiconductor layers.
Dichlorosilane
Dichlorosilane enables the growth of crystalline silicon thin films at low temperatures, with higher growth rates than silane in the semiconductor and solar industries.
Trichlorosilane
Trichlorosilane enables the growth of crystalline silicon thin films at low temperatures, with higher growth rates than silane in the semiconductor and solar industries.
Phosphine
Phosphine is used as an ion-implantation source for n-type doping in semiconductor and solar fabrication, and a CVD source for n-type doping in semiconductor and display manufacturing.
Arsine
Arsine is used as an ion-implantation source for n-type doping in semiconductor fabrication. It’s also the raw material for epitaxial growth of crystalline cells in semiconductors and solar cells.